隨著納米科技的迅速發(fā)展，下一代光刻技術(shù)在微細(xì)加工領(lǐng)域發(fā)揮著日益重要的作用。
作為復(fù)雜半導(dǎo)體加工主要手段之一的電子束曝光系統(tǒng)，需要穩(wěn)定完善的控制軟件來保證其正常運(yùn)行。本文介紹了電子束曝光控制系統(tǒng)的設(shè)計(jì)原理，并著重介紹了其對電子束曝光的全過程進(jìn)行控制的強(qiáng)大功能。
關(guān)鍵詞：電子束曝光控制系統(tǒng)繪制圖形
Abstract: With the quick development of nanoscience and nanotechnology, Next Generation
Lithography has played more and more important role in the field of micro-fabrication. As one
of the complicated semiconductor machining equipments, electron beam lithography system needs steady control software system to ensure that it can run correctly. In this paper, the fundamental theories of the newly developed control system for electron beam lithography are introduced. Furthermore, the robust control of the whole process from creating exposure files until the final exposure is discussed in particular.
Key Word: Electron beam Lithography, Control system, Draw graphics